Buffered Oxide Etchants (BOE) Market REPORT OVERVIEW
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The global buffered oxide etchants market size is expected to be USD 73 million in 2022 and market is projected to touch USD 172.5 million by 2031, exhibiting a compound annual growth rate (CAGR) of 10.0% during the forecast period.
The wet etchant buffered oxide etch, also referred to as BOE, is primarily used in microfabrication. For etching silicon dioxide or silicon nitride thin films, it is used. Hydrofluoric acid and a buffering agent, such as ammonium fluoride, are combined to create buffered oxide etchant. In addition to swiftly etchering silicon dioxide for improved process control, distilled HF (typically 49% HF in water) also peels the photoresist used in lithographic patterning.
In order to remove material from a wafer surface, a buffered oxide etchant is employed. For additional device processing, BOE's primary goal is to create pristine and slick surfaces. Silicon dioxide layers that are deposited during the creation of integrated circuits are etched using buffered oxide etching in the semiconductor manufacturing industry. The fundamental idea behind buffered oxide etching is that the silicon dioxide coating is removed by an acid at a rate that is quicker than that of the silicon substrate underneath it. After that, a buffer layer (often carbon) is placed on top of the etched silicon dioxide film to guard against additional acidic damage. Additionally, the buffer layer aids in regulating etching depth.
COVID-19 Impact: Lockdowns and Restrictions Led to Lower Demand in the Market.
Covid badly affected the buffered oxide etchant market due to supply chain disruptions and shortage in raw materials was also observed. Shortage of labor and strict protocols such as lockdowns and restrictions on movement created roadblocks, disruptions in end-use sectors of the product led to lower demand.
LATEST TRENDS
"Increased Demand for Buffered Oxide Etchant to Accelerate the Market"
A wet etching technique called conventional semiconductor grade buffered oxide etchant is used to remove silicon dioxide from semiconductor surfaces. The etchant used in it is an aqueous solution of hydrofluoric acid and nitric acid. The silicon dioxide and etchant interact to create fluorine gas, which then splits into hydrogen fluoride and oxygen gas. The surface of the wafer is etched with characteristics as a result of the hydrogen fluoride attacking the silicon below.
The main purpose of buffered oxide etchant in silicon etching is to etch an oxide layer onto the surface of a silicon wafer. On the silicon's surface, this may be utilized to make a variety of structures, such as trenches, holes, and fins. The buffered oxide etchant is a crucial tool in today's semiconductor production since it enables fine control over these structures.
Buffered Oxide Etchants (BOE) Market Segmentation
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- By Type Analysis
By type, market is segmented into organic lentil flour and conventional lentil flour. The organic lentil flour segment will dominate the market in the coming years.
- By Application Analysis
Based on applications, the market is classified into infant food, bakery & snacks and others. The infant food segment will lead the global share through 2028.
DRIVING FACTORS
"Rising Demand for Semiconductor Devices to Propel the Market"
The market's high CAGR throughout the anticipated period may be attributed to a few reasons, including the rising demand for semiconductor devices and the substantial presence of market players globally. The need for Buffered Oxide Etchant is anticipated to rise in tandem with the rise in semiconductor demand.
"Fine Electronic Grade Buffered Oxide Etchant to Push the Market"
In order to be used in semiconductors and other electronic applications, Fine Electronic Grade Buffered Oxide Etchant (BOE) is a particular kind of buffered oxide etchant. Other materials, such as silica, can also be etched with it in addition to silicon dioxide, which is its usual target. The Fine Electronic Grade BOE provides a lot of benefits over other kinds of buffered oxide etches. The etched surface can be controlled more effectively and with greater precision. The underlying substrate is also not as affected by it.
RESTRAINING FACTORS
"Adverse Effects of Buffered Oxide Etchant Led to Market’s Decline"
The main factor anticipated to restrain the market growth of the worldwide Buffered Oxide Etchant market during the projected period is the adverse effects of buffered oxide etchants, which include skin irritation, eye damage, and many more.
Buffered Oxide Etchants (BOE) Market REGIONAL INSIGHTS
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"North America to Grow Exponentially During the Forecasted Period"
Due to the presence of several semiconductor businesses in this area, North America is anticipated to have the highest position in the worldwide buffered oxide etchant market. Due to the increasing demand for semiconductor devices in this region, buffered oxide etchant is anticipated to have its second-largest market in Latin America. Due to the rising demand for electronic devices in this area, the market for buffered oxide etchant is anticipated to develop at the quickest rate in Asia Pacific.
KEY INDUSTRY PLAYERS
"Key Players Focus on Partnerships to Gain a Competitive Advantage "
Prominent market players are making collaborative efforts by partnering with other companies to stay ahead in the competition. Many companies are also investing in new product launches to expand their product portfolio. Mergers and acquisitions are also among the key strategies used by players to expand their product portfolio.
List of Market Players Profiled
- Stella Chemifa (Japan)
- Zhejiang Kaisn Fluorochemical (China)
- Zhejiang Morita New Materials (China)
- Soulbrain (South Korea)
- KMG Chemicals (U.S.)
- Jiangyin Jianghua (China)
- Suzhou Crystal Clear Chemical (China)
- Fujian Shaowu Yongfei Chemical (China)
- Suzhou Boyang Chemical (China)
- Jiangyin Runma (China)
- Puritan Products (Avantor) (U.S.)
- Columbus Chemical Industries (U.S.)
- Transene Company (U.S.)
REPORT COVERAGE
The market research study examines the worldwide market in detail, focusing on important elements such as leading players, products/services or type, and leading end-use applications. Aside from that, the research analyses major advancements and provides insights into lighting market trends. In addition to the causes indicated above, the paper includes a number of other factors that have
REPORT COVERAGE | DETAILS |
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Market Size Value In |
US$ 73 Million in 2022 |
Market Size Value By |
US$ 172.5 Million by 2031 |
Growth Rate |
CAGR of 10% from 2022 to 2031 |
Forecast Period |
2024-2031 |
Base Year |
2023 |
Historical Data Available |
Yes |
Regional Scope |
Global |
Segments Covered |
Type and Application |
Frequently Asked Questions
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What value is the buffered oxide etchants market expected to touch by 2031?
Over the research period, the buffered oxide etchants market will be reaching USD 172.5 million in 2031.
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What CAGR is the Buffered Oxide Etchants Market expected to exhibit by 2031?
The Buffered Oxide Etchants Market is expected to exhibit a CAGR of 10.0% by 2031.
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Which are the driving factors of the Buffered Oxide Etchants Market?
Rising demand for semiconductor devices and fine electronic buffered oxide etchants are the drivers of the Buffered Oxide Etchants Market.
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Which are the top companies operating in the Buffered Oxide Etchants Market?
Fluorochemical, FDAC, Zhejiang Morita New Materials and Soulbrain are some of the top companies operating the Buffered Oxide Etchants Market.