EUV Mask Blanks Market Size, Share, Growth, and Industry Analysis, By Type (Type I, Type II and Others), By Application [Semiconductor, IC (integrated circuit) and Others], Regional Insights, and Forecast To 2033

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EUV MASK BLANKS MARKET REPORT OVERVIEW

Global euv mask blanks market size was USD 0.24 Billion in 2024 and market is projected to touch USD 0.97 Billion by 2033, exhibiting a CAGR of 16.5% during the forecast period.

Extreme ultraviolet lithography, often known as EUV or EUVL, is a chip printing and manufacturing technique that employs a variety of extreme ultraviolet (EUV) wavelengths with a 2% FWHM bandwidth of roughly 13.5 nm. As mask blanks, thin films of chrome or molybdenum silicide are formed on a quartz or soda-lime glass substrate. They are also coated with photosensitive resist materials that are sensitive to electron or laser beams and resist etching in order to produce circuit patterns. EUV mask blanks are low-thermal expansion glass substrates with various optical coating films applied to their surfaces. On the substrate, the EUV mask blank is made up of 40 to 50 or more alternating layers of silicon and molybdenum.

COVID-19 IMPACT

"The Pandemic Dysfunctional the Market Growth"

COVID-19 sickness began to spread in 180+ countries throughout the world in December 2019, and the World Health Organisation declared it a health crisis. COVID-19 has had a detrimental influence on the market by interrupting the supply chain for the manufacture of phones and screens and lowering smartphone sales globally due to the shutdown of certain cities. The shutdown, which has slowed economic activity, is expected to have a stronger impact in the near future as governments around the world tighten controls. Because to the prolonged lockdown, industries were forced to temporarily close, causing delays in the manufacture and shipment of goods.

LATEST TRENDS

"The Product Innovation to Attract the Market Share"

According to the ITRS 2001 Lithography Roadmap, extreme ultraviolet (EUV) lithography is being developed to replace 157nm lithography for commercial IC manufacture at the 45nm technology node. To satisfy future commercial needs, EUV masks present numerous production and technical obstacles. Despite the fact that only Hoya and AGC are currently on the market with commercial delivery capabilities, we included research samples or low-volume goods for usage based on the current state of the technology in this industry.

EUV MASK BLANKS MARKET SEGMENTATION

By Type Analysis

Based on type, the EUV mask blanks market is subdivided into type I, type II and others.

The part type I is the leading part of the type segment.

By Application Analysis

Based on the applications, the EUV mask blanks market is subdivided into semiconductor, IC (integrated circuit) and others.

The part semiconductor is the leading part of the application segment.

DRIVING FACTORS

"The Increase in IC Manufacturing and Consumption to Amplify the Market Share"

An EUV mask blank has been in limited production for years and is a critical component in an EUV photomask. The process of manufacturing a mask begins with the creation of a mask blank or substrate. After a mask blank manufacturer creates the blank, it is transported to a photomask maker, where the mask is processed on the substrate. To produce a chip, a photomask is necessary. A chipmaker creates an IC in the design-through-manufacturing phase, which is then translated from a file format and created as a mask. The mask is a master template for an integrated circuit design.

Extreme ultraviolet lithography (EUVL) is a cutting-edge, next-generation lithography technology for IC manufacturing at the 45 nm technology node and below. Multilayer-structured masks and reflecting optics are essential in EUV technology. Patterned absorbers are an EUV mask feature that allows for the development of IC features during exposure.

"The Rising Interest for Multi-Layer Films and Applied Materials to Uplift the Market Share"

Currently, the production requirements for EUV masks are defined by two SEMI standards: one for the substrate and another for (multilayer) ML films. Commercial suppliers of EUV mask blanks are working on the ML and deposition procedures for reflective and absorber films. A variety of performance standards must be met in order to meet the production requirements. Suppliers of EUV mask blanks are growing their output as the market for extreme ultraviolet (EUV) lithography grows. In addition, Applied Materials is planning to enter the market.

RESTRAINING FACTORS

"Thus Certain Issues with the Functioning and the High Costs to Restrain the Market Growth"

Although some EUV mask production procedures can be expanded from present optical masks, several additional challenges occur as a result of the change to an all reflecting multilayer mirror system with patterned features against standard optical masks. EUV lithography at 13.4 - 13.5 nm wavelength demands outstanding multilayer performance, including peak reflectance, wavelength matching to the optical system, and very low defect levels. To fulfil EUV mask needs, the Low Thermal Expansion Material (LTEM) that is utilized as a substrate for the multilayer reflector requires demanding performance levels such as Coefficient of Thermal Expansion (CTE), flatness, and roughness. Performance gains of several orders of magnitude. Other dynamics are at work here. There is a potential supply shortage in the market for low-defect EUV mask blanks—and high costs. An EUV mask blank with tighter specifications can cost more than $100,000. Thus, the issues being highlighted throughout the process and the high cost to hinder the EUV mask blanks market growth.

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EUV MASK BLANKS MARKET REGIONAL INSIGHTS

"Asia Pacific Region to Lead with Presence of Key Players and Multi-Mode Production"

The economy of important nations like Japan and China are expanding, which is increasing consumer disposable income. Consequently, we are moving in the direction of embracing high-end technological devices driving the region's market for EUV mask blanks. Furthermore, Chinese businesses are working swiftly to establish massive production facilities to produce mass blanks. The two leading manufacturers of EUV mask blanks, AGC and Hoya, are increasing capacity for these crucial components used in EUV photomasks. The substrate for a photomask is a mask blank. Meanwhile, Applied Materials has given presentations on its efforts and potential entry into the EUV mask blank market at a number of recent events. Applied is working on next-generation EUV blanks. The demand will therefore fuel the expansion of the EUV mask blanks market share in the area.

KEY INDUSTRY PLAYERS

"The Prominent Players Contributing in the Market Growth"

The report covers the information on the advancement outlooks with new inventions and SWOT analysis. The market elements situation, with the development areas of the market in the upcoming years.

List of Top Euv Mask Blanks Companies

• AGC Inc (Japan)
• Hoya (Japan)
• S&S Tech (South Korea)
• Applied Materials (U.S.A)
• Photronics Inc (U.K).

REPORT COVERAGE

The report examines elements affecting the demand and supply sides and estimates dynamic market forces for the forecast period. The report offers drivers, restraints, and future trends. After evaluating governmental, financial, and technical market factors, the report provides exhaustive PEST and SWOT analysis for regions. The research is subject to alteration if the key players and probable analysis of market dynamics change. The information is an approximate estimate of the factors mentioned, taken into consideration after thorough research.