Extreme Ultraviolet Lithography (EUL) Market REPORT OVERVIEW
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The global Extreme Ultraviolet Lithography (EUL) market size was USD 6067.1 million in 2022 and market is projected to touch USD 36280.64 million by 2031 with a CAGR of 22.0% during the forecast period.
The sudden spike in CAGR is attributable to the market's growth and demand returning to pre-pandemic levels once the pandemic is over.
Extreme Ultraviolet Lithography (EUL) is an optical lithography technology. It is primarily used in steppers and ICs which produce integrated circuits for various electronic devices, specifically computers. They produce a pattern using extreme Ultraviolet wavelengths.
These wavelengths approximately span up to 2% bandwidth. The lithography technology is used in the device fabrication process of semiconductors. The demand for this product has also seen a spike recently.
Another notable innovation in the market is the ability of this technology to spot even the finest details on the most advanced microchips. This can be identified as the latest trend in the market.
The global Extreme Ultraviolet Lithography (EUL) technology mainly integrates very efficient microchips called the mass-producing leading-edge microchips. This technology is considered as one of the leading technologies of the future generation. It is characterized with features such as superior pattern fidelity, wider process windows, and many more. A lot of factors have contributed in the growth of this technology.
COVID-19 impact: Reduced Production of Semiconductors Decreased the Market Growth
The pandemic of COVID-19 affected the global economy. A lot of industries were shut down due to the prevailing lockdowns and strict social distancing norms. Global Extreme Ultraviolet Lithography (EUL) is used in the semi-conductor industry especially during the process of device fabrication.
The operations of the semiconductor market temporarily stopped during the pandemic because the availability of skilled workers declined. The required resources were scare, and the equilibrium in the supply chain was not maintained. With a decline in the semiconductor industry the global Extreme Ultraviolet Lithography (EUL) market share also fell. However, owing to the demand in the internet of things the market observed a steady increase after the pandemic.
LATEST TRENDS
"Ability to Spot the Finest Details to Increase the Market Growth"
Global Extreme Ultraviolet Lithography (EUL) technology is of the most advanced technological developments in the recent time. This has a bandwidth of about 13.5 nanometer which helps in creating a pattern of exposing reflective photomask to Ultraviolet light.
This light gets reflected on the surface of a substrate. The substrate is covered up by a photoresist. Another notable innovation in the market is the ability of this technology to spot even the finest details on the most advanced microchips. This can be considered the new trend in the market.
Extreme Ultraviolet Lithography (EUL) Market SEGMENTATION
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- By Type:
The market can be divided on the basis of type into the following segments:
Light Source, Mirror, Mask, and, Others. The light source segment is anticipated to dominate the market during the forecast period.
- By Application:
Classification based on application into the following segment:
Integrated Device Manufacturers (IDM), and Foundry. The Integrated Device Manufacturers (IDM) segment is predicted to dominate the market during the research period.
DRIVING FACTORS
"Integration Of Mass-Producing Leading-Edge Microchips to Fasten the Market Growth"
The global Extreme Ultraviolet Lithography (EUL) technology mainly integrates very efficient microchips. These chips are known as the mass-producing leading-edge microchips. These microchips are very powerful. This is one of the major driving factors.
EUV lithography has the capacity to incorporate more transistors on a single chip. These chips are highly affordable. Apart from that they also have high processing brainpower. The energy consumed by these microchips is also very less. The performance delivered is of high quality.
"Extendibility To Future Nodes to Propel the Market Growth "
Along with the incorporation of high-processing microchips the Ultraviolet Lithography (EUL) technology also has many features that can increase its demand all over the world. These superior features drive the global Extreme Ultraviolet Lithography (EUL) market growth.
This technology is characterized with superior pattern fidelity. It also allows wider process windows. It also has the potentials to extend to the future nodes. The wavelength is also extremely short. They can be used for printing lines as small as 30 nanometers. Micro processors are also developed with the assistance of this leading next generation technology.
RESTRAINING FACTOR
"Complexities In Developing Proper Photoresists to Bring Down the Market Growth"
Even though Extreme Ultraviolet Lithography (EUL) technology has several advantages and it is extremely advanced, it has its own disadvantages. Photoresists form a major component of this technology. Many complexities are involved in developing proper photoresists.
Also, the formation of a perfect mask is yet another challenge. The cost of using this lithography technology is high and the prices keep on fluctuating. This method is considered to be more complex compared to the ArFi lithography technology. This can be a major restraining factor for the market growth.
Extreme Ultraviolet Lithography (EUL) Market Regional Insights
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"Asia Pacific to Dominate the Market in The Upcoming Years"
According to reports Asia Pacific region is predicted to grow as well hold a dominant part of the market during the forecast period. As of now it holds more than one-fourth of the shares in the revenue. Since 2018, Asia Pacific is leading the market. Many reasons have contributed to the growth of the market in Asia Pacific.
The increased shares can be attributed to rapidly growing EUV lithography market in some prominent countries like China. The demand for miniaturized devices has been higher than before especially in this region. With the increase in the water processing capability the market has also grown. All these factors are collectively increasing the market share in Asia Pacific region.
Key Industry Players
"Leading Players adopt Acquisition Strategies to Stay Competitive "
Several players in the market are using acquisition strategies to build their business portfolio and strengthen their market position. In addition, partnerships and collaborations are among the common strategies adopted by companies. Key market players are making R&D investments to bring advanced technologies and solutions to the market.
List of Market Players Profiled
- ASML (Netherlands)
- Nikon (Japan)
- Canon (Japan)
- Carl Zeiss (Germany)
- Toppan Printing (Japan)
- NTT Advanced Technology (Japan)
- Intel (U.S.)
- Samsung (South Korea)
- SK Hynix (South Korea)
- Toshiba (Japan)
- TSMC (Taiwan)
- Global foundries (U.S.)
Report Coverage
The report provides an insight into the global Extreme Ultraviolet Lithography (EUL) industry from both the demand and supply sides. Further, it also gives information on the impact of COVID-19 on the market, the driving and the restraining factors along with the regional insights. Market dynamic forces during the forecast period have also been discussed for the better understanding of the market situations. This report is very useful for forecasting the future of this technology.
REPORT COVERAGE | DETAILS |
---|---|
Market Size Value In |
US$ 6067.1 Million in 2022 |
Market Size Value By |
US$ 36280.64 Million by 2031 |
Growth Rate |
CAGR of 22% from 2022 to 2031 |
Forecast Period |
2024-2031 |
Base Year |
2023 |
Historical Data Available |
Yes |
Regional Scope |
Global |
Segments Covered |
Type and Application |
Frequently Asked Questions
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What value is global Extreme Ultraviolet Lithography (EUL) market expected to touch by 2031?
The global Extreme Ultraviolet Lithography (EUL) market is projected and estimated to touch USD 36280.64 million by 2031.
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What CAGR is the Extreme Ultraviolet Lithography (EUL) market expected to exhibit by 2031?
The Extreme Ultraviolet Lithography (EUL) market is expected to exhibit a CAGR of 22.0% by 2031.
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Which are the driving factors of the Extreme Ultraviolet Lithography (EUL) market?
The global Extreme Ultraviolet Lithography (EUL) technology mainly integrates very efficient microchips called the mass-producing leading-edge microchips. This technology is considered as one of the leading technologies of the future generation. These are factors propelling the market growth.
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Which are the top companies operating in the Extreme Ultraviolet Lithography (EUL) market?
ASML, Nikon, Canon, Carl Zeiss, Toppan Printing, NTT Advanced Technology, and Intel are some of the top companies operating in the Extreme Ultraviolet Lithography (EUL) market.